PRODUCTS
Easytube 101
The EasyTube® 101 is a budget friendly, small footprint, reliable, and repeatable CVD system for the advanced R&D user. The system has a usable processing area of 25 mm x 50 mm. Up to 8 input lines are available for gases. 3 of the input lines can be configured for vapor delivery of solid or liquid sources.
Easytube 2000
The EasyTube® 2000 is an advanced turnkey chemical vapor deposition system for the synthesis of a wide variety of thin films and nanomaterials.
The base system can process 50 mm x 50 mm diameter substrates and has a 3-zone resistance heated furnace.
Easytube 3000/3000EXT
The EasyTube® 3000 advanced CVD system is our best-selling and most capable product for university labs and industry R&D facilities. The base system includes a cylindrical quartz process tube which can be from 70 mm to 130 mm ID depending on the desired substrate size. A range of optional modules can be configured to meet the specific requirements of the end user.
Easytube 6000/6308
The EasyTube® 6000 Series can be configured for batch processing of multiple wafers with up to four (4) separately configured reactors in the same system. Our ET6000 and ET6308 systems are used worldwide in complementary metal-oxide-semiconductor (CMOS) and micro-electro-mechanical systems (MEMS) fabrication plants.
