PRODUCTS

26LSC4000

LSC-4000

Automatic mask cleaner, incorporates a number of cleaning techniques for a better finish. It is useful for cleaning after wet etch or photoresist stripping. Ideal for 21’’ OD, 15’’ x 15’’ substrates and 450 mm wafers.

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32SWC3000

SWC-4000

Wafer cleaner compatible with substrates up to 21’’ OD and 7’’ x 7’’, incorporates a megasonic cleaning system, chemical cleaning and a brush. Useful for masks and patterned wafers.

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33SWC3000

SWC-3000

Table top unit, incorporates a megasonic cleaning system for a damage free cleaning with spin dry, has the capacity to accommodate up to 21’’ OD and 7’’ x 7’’ substrates.

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