PRODUCTS
LSC-4000
Automatic mask cleaner, incorporates a number of cleaning techniques for a better finish. It is useful for cleaning after wet etch or photoresist stripping. Ideal for 21’’ OD, 15’’ x 15’’ substrates and 450 mm wafers.
SWC-4000
Wafer cleaner compatible with substrates up to 21’’ OD and 7’’ x 7’’, incorporates a megasonic cleaning system, chemical cleaning and a brush. Useful for masks and patterned wafers.
SWC-3000
Table top unit, incorporates a megasonic cleaning system for a damage free cleaning with spin dry, has the capacity to accommodate up to 21’’ OD and 7’’ x 7’’ substrates.
